Last Updated 05/20/04
PEEM3 will be a new generation Aberration Corrected Photo-Emission Electron Microscope with a spatial resolution of <5nm. It will be located on the soft x-ray undulator beamline 11.0.1. The high flux, high spatial resolution and a temporal resolution of 50ps will allow this new instrument to study complex materials with unprecedented capabilities. Elemental, chemical and magnetic specificity will be possible. The instrument will consist of electrostatic lenses, a magnetic beam separator and an electrostatic mirror.
Schematic layout of the aberration corrected PEEM3 microscope. Photoemmited electrons from the sample are imaged by the electrostatic objective lens into the magnetic separator magnet which deflect the electrons 90 degrees into an electron mirror (M1). The mirror is arranged to have the opposite aberrations to that of the electrostatic lenses such that aberrations are canceled and a high spatial resolution will be achieved. The electrons return through the separator for another 90 degree turn before being projected onto the CCD-1 on the right. By turning off the M1 voltage, the electrons pass through a hole in the M1 mirror and are imaged onto CCD-2. This second CCD-2 acts as a diagnostic by acting as a check on the optic performance half way through the optic train. Key:- D=deflector, F=Field lens, I=intermediate lens, M= mirror lenses, P=projector lens.
